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Plasma Apparatus
ISP500 Series
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ISP500LU

  • Special electrode built in for getting good plasma efficient.
  • RIE/DP mode selectable
  • RF power up to 500W
  • All automatic operation
  • LCD touch panel and PLC control
  • Any chamber size are available for customer's Lead frame or strip.
In-Line and Stand Alone Type
(Strip to Strip process)

Two lead frame (strip) vertical or parallel loading function. Pull out two strip from Magazine--Loading two strip into the chamber--Plasuma cleaning process--Unloading two strip from chamber--Strip goes to magazine or next process to direct.
Total system controlled by PLC controller. LCD touch panel display and operation. Lead frame (strip) size--Up to 25 to 80(W)×100 to 250(L)×0.2 to 2.5(t)mm also. We can provide Customized In-Line plasma.

Plasma Mode
RIE/DP
RIE : Reactive Ion Etching
DP : Direct Plasma
RF Generator
10 to 500W
Oscillating Frequency
13.56MHz
Chamber Size (mm)
344W×230D×45H

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Specifications
Model ISP500 series
Plasma method RIE/DP mode
RF generator 10 to 500W
Oscillation frequency 13.56MHz
Control system LCD touch panel with PLC
Tuning method Automatic tuning
Chamber size 344(W)×230(D)×45(H)mm
Electrode size 250(W)×180(D)mm
Gas system Mass flow control 2 line
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